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For the Inventor, By the Inventor

Wappingers Falls, NY, United States of America

Rebecca D Mih

USPTO Granted Patents = 24

Average Co-Inventor Count = 3.8

ph-index = 7

Forward Citations = 195(Granted Patents)


Location History:

  • Wappingers Falls, NY (US) (1999 - 2004)
  • Los Gatos, CA (US) (2012 - 2014)

Company Filing History:

goldMedal24 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1999-2014

where 'Filed Patents' based on already Granted Patents

24 patents (USPTO):
1. 8815475 - Reticle carrier (2014-08-26),
2. 8439728 - Reticle carrier (2013-05-14),
3. 8110321 - Method of manufacture of damascene reticle (2012-02-07),
4. 6727589 - Dual damascene flowable oxide insulation structure and metallic barrier (2004-04-27),
5. 6504207 - Method to create EEPROM memory structures integrated with high performance logic and NVRAM, and operating conditions for the same (2003-01-07),
6. 6479884 - Interim oxidation of silsesquioxane dielectric for dual damascene process (2002-11-12),
7. 6448629 - Semiconductor device and method of making same (2002-09-10),
8. 6429522 - Microprocessor having air as a dielectric and encapsulated lines (2002-08-06),
9. 6429067 - Dual mask process for semiconductor devices (2002-08-06),
10. 6407396 - Wafer metrology structure (2002-06-18),
11. 6391703 - Buried strap for DRAM using junction isolation technique (2002-05-21),
12. 6348736 - In situ formation of protective layer on silsesquioxane dielectric for dual damascene process (2002-02-19),
13. 6329280 - Interim oxidation of silsesquioxane dielectric for dual damascene process (2001-12-11),
14. 6326275 - DRAM cell with vertical CMOS transistor (2001-12-04),
15. 6284574 - Method of producing heat dissipating structure for semiconductor devices (2001-09-04),

Title: **Innovations by Rebecca D. Mih in the Field of Polishing Technology**

Introduction

Rebecca D. Mih, located in Wappingers Falls, NY, is an accomplished inventor with an impressive portfolio of 24 patents. Her contributions to the field of polishing technology have not only advanced industry standards but have also provided efficient solutions for various applications.

Latest Patents

Among her latest innovations is a groundbreaking reticle carrier designed for polishing tools. This reticle carrier includes a robust base plate with obverse and reverse surfaces, complemented by a retaining ring that forms a recess. A reticle pad within this recess is pivotal for securely supporting a reticle. The design features an array of aligned passageway holes that facilitate air exhaustion and supply, creating a vacuum that retains the reticle in place. Additionally, the application of air under pressure enables the efficient ejection of the reticle from the carrier, optimizing both functionality and performance.

Career Highlights

Rebecca D. Mih is currently associated with the prestigious International Business Machines Corporation (IBM). Throughout her career, she has consistently demonstrated her ability to innovate and improve existing technologies, particularly in polishing methodologies.

Collaborations

In her journey, Rebecca has collaborated with notable colleagues, including Kevin Shawn Petrarca and Joyce C. Liu. Their teamwork has fostered a creative environment that encourages the development of novel inventions and technological advancements.

Conclusion

Rebecca D. Mih stands out as a formidable inventor whose work significantly influences polishing technologies. Her patents reflect a commitment to innovation and excellence, establishing her as a key figure within her field. As she continues to push the boundaries of invention, the industry eagerly anticipates her future contributions.

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