The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
Jul. 29, 1999
Rebecca D. Mih, Wappingers Falls, NY (US);
Kevin S. Petrarca, Newburgh, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A second or cap dielectric layer is interposed between the usual or base dielectric layer and the metallic circuitry layer of a semiconductor device. The base dielectric layer has a plurality of recesses in an inactive part of the semiconductor device into which parts of the cap dielectric layer extend to interlock the cap dielectric layer to the base dielectric layer and to oppose shearing or tearing of the either (1) the metallic circuitry layer as the metallic circuitry layer is subjected to chemical-mechanical polishing, or (2) a hard mask layer from the base dielectric layer as the metallic circuitry layer is subjected to chemical-mechanical polishing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile