The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Dec. 05, 2002
Wu-song Huang, Poughkeepsie, NY (US);
Wenjie LI, Poughkeepsie, NY (US);
Wayne Moreau, Wappingers Falls, NY (US);
David R. Medeiros, Ossining, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
Robert N. Lang, Pleasant Valley, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Wenjie Li, Poughkeepsie, NY (US);
Wayne Moreau, Wappingers Falls, NY (US);
David R. Medeiros, Ossining, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
Robert N. Lang, Pleasant Valley, NY (US);
Marie Angelopoulos, Cortlandt Manor, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The resist compositions having an acid sensitive imaging polymer and a radiation sensitive acid generator component comprising: (i) a first radiation sensitive acid generator selected from the group consisting of dissolution-inhibiting acid generators, and (ii) a second radiation sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized acid generators and acid labile group-protected acidic group-functionalized radiation sensitive acid generators; enables formation of high sensitivity resists suitable for use in EPL, EUV, soft x-ray, and other low energy intensity lithographic imaging applications. The resist compositions may be useful in other lithographic processes as well.