Company Filing History:

23 out of 164,108

International Business Machines Corporation

Years Active: 2003-2017

where 'Filed Patents' based on already Granted Patents

24 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9726977 - Coating compositions suitable for use with an overcoated photoresist (2017-08-08),

2. 8202678 - Wet developable bottom antireflective coating composition and method for use thereof (2012-06-19),

3. 7754820 - Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application (2010-07-13),

4. 7700262 - Top coat material and use thereof in lithography processes (2010-04-20),

5. 7651831 - Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use (2010-01-26),

6. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),

7. 7638264 - Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use (2009-12-29),

8. 7563563 - Wet developable bottom antireflective coating composition and method for use thereof (2009-07-21),

9. 7435537 - Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application (2008-10-14),

10. 7335456 - Top coat material and use thereof in lithography processes (2008-02-26),

11. 7314700 - High sensitivity resist compositions for electron-based lithography (2008-01-01),

12. 7235342 - Negative photoresist composition including non-crosslinking chemistry (2007-06-26),

13. 7217496 - Fluorinated photoresist materials with improved etch resistant properties (2007-05-15),

14. 7081326 - Negative photoresist and method of using thereof (2006-07-25),

15. 7063931 - Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use (2006-06-20),

Title: Innovator Spotlight: Wenjie Li - Pioneering the Future of Coating Compositions in Poughkeepsie, NY

Introduction: Wenjie Li, a brilliant inventor based in Poughkeepsie, NY, has revolutionized the field of coating compositions with his groundbreaking patents and innovative solutions.

Latest Patents: Among Wenjie Li's 24 patents, two recent standout inventions include coating compositions suitable for use with an overcoated photoresist and a wet developable bottom antireflective coating composition. These patents showcase his expertise in developing advanced materials for the semiconductor industry.

Career Highlights: With a distinguished career, Wenjie Li has made significant contributions at renowned companies such as IBM and Globalfoundries Inc. His work has paved the way for cutting-edge technologies and advancements in the realm of semiconductor manufacturing.

Collaborations: Throughout his career, Wenjie Li has collaborated closely with esteemed colleagues such as Pushkara Rao Varanasi and Margaret C Lawson. Together, they have synergized their expertise to push the boundaries of innovation and create impactful solutions.

Conclusion: Wenjie Li stands as a trailblazing figure in the world of inventors, continuously pushing the envelope of what is possible in the realm of coating compositions. His dedication to excellence and commitment to innovation continue to inspire future generations of inventors and researchers.

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2 patents (EPO):

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1 patent pending (EPO):

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