The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Jul. 17, 2001
Marie Angelopoulos, Cortlandt Manor, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Dai Junyan, Ithaca, NY (US);
Ranee W. Kwong, Wappingers Falls, NY (US);
Robert N. Lang, Pleasant Valley, NY (US);
Arpan P. Mahorowala, Bronxville, NY (US);
David R. Medeiros, Ossining, NY (US);
Wayne M. Moreau, Wappingers Falls, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.