Company Filing History:
Years Active: 2003
Title: The Innovations of Dai Junyan
Introduction
Dai Junyan is a notable inventor based in Ithaca, NY (US). He has made significant contributions to the field of photoresist systems, particularly through his innovative patent. His work is recognized for its potential impact on electronic component manufacturing.
Latest Patents
Dai Junyan holds a patent for an improved resist system containing acrylate (or methacrylate) silane monomers. This chemically amplified (CA) photoresist system features a terpolymer that includes ketal, phenolic, and silicon-based sidechains. The terpolymers enhance bake technologies, which are crucial for lithographic treatment processes. Additionally, his patent outlines a process for treating substrates using these compositions, which is particularly relevant for producing electronic components.
Career Highlights
Dai Junyan is associated with International Business Machines Corporation (IBM), where he applies his expertise in developing advanced materials for technology applications. His work at IBM has positioned him as a key player in the innovation of electronic manufacturing processes.
Collaborations
Dai has collaborated with notable colleagues, including Marie Angelopoulos and Wu-Song S Huang. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.
Conclusion
Dai Junyan's contributions to the field of photoresist systems exemplify the importance of innovation in technology. His patent and work at IBM highlight his role in advancing electronic component manufacturing.