Location History:
- Wappinger Falls, NY (US) (1990)
- Wappings Falls, NY (US) (1994)
- Wappingers Falls, NY (US) (1987 - 2015)
Company Filing History:
32 out of 164,108 
1 out of 832,680 Years Active: 1987-2015
Title: Innovations of Ranee W Kwong: A Pioneering Inventor in Photolithographic Technologies
Introduction
Ranee W Kwong, based in Wappingers Falls, NY, has made significant contributions to the field of photolithographic technologies with an impressive portfolio of 33 patents. His innovative work focuses on developing advanced coatings and methods that enhance the precision of semiconductor manufacturing.
Latest Patents
Ranee's latest patents showcase his expertise in creating cutting-edge materials for lithographic processes. One notable patent, titled "Developable Bottom Antireflective Coating Composition and Pattern Forming Method Using Thereof," involves a specialized bottom antireflective coating (BARC) composition. This composition includes a first polymer with unique moieties and a second polymer that works synergistically to improve light absorption in the ultraviolet spectrum. The method described allows for precise pattern formation by employing a photoresist layer on top of a BARC layer, followed by selective removal to achieve a structured design. Additionally, his patent on the "Removal of Alkaline Crystal Defects in Lithographic Patterning" introduces an effective technique for cleaning substrates post-exposure, ensuring flawless surfaces are maintained for subsequent fabrication steps.
Career Highlights
Throughout his career, Ranee has worked with prominent companies, including International Business Machines Corporation (IBM). His roles at such organizations highlight his integral participation in pioneering research and development projects, where he contributed to the advancement of lithographic technologies that are vital for modern electronics.
Collaborations
Ranee has collaborated with notable professionals in the field, including Wu-Song S Huang and Marie Angelopoulos. Their combined expertise has driven innovation in semiconductor manufacturing processes, pushing the boundaries of what is technologically achievable.
Conclusion
Ranee W Kwong remains a critical figure in the realm of innovations surrounding photolithography. With his vast number of patents and collaborative efforts, he exemplifies the role of an inventor dedicated to enhancing precision and efficiency in semiconductor manufacturing. His contributions not only influence current technologies but also pave the way for future advancements in the industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.