The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jan. 09, 2002
Applicant:
Inventors:
Ari Aviram, Croton-on-Hudson, NY (US);
C. Richard Guarnieri, Somers, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ranee W. Kwong, Wappingers Falls, NY (US);
David R. Medeiros, Yorktown, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/40 ;
Abstract
Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.