Location History:
- Somer, NY (US) (1995 - 1997)
- Somers, NY (US) (1984 - 2005)
Company Filing History:
17 out of 164,108 
2 out of 832,680 Years Active: 1984-2005
Title: The Innovations of C Richard Guarnieri: A Visionary in Photomask Technology
Introduction: C Richard Guarnieri, based in Somers, NY, is an accomplished inventor with a portfolio of 19 patents to his name. His innovative work primarily focuses on advanced materials and fabrication techniques in the photomask industry. Guarnieri's contributions are significant in enhancing the performance and reliability of photomasks used in semiconductor manufacturing and other applications.
Latest Patents: Among his most recent patents is the invention of "Attenuated Embedded Phase Shift Photomask Blanks." This invention features an optically translucent film made of metal, silicon, nitrogen, or a combination of these materials. The patent demonstrates a wide range of optical transmission capabilities (from 0.001% to 20% at 193 nm), achieved through a post-deposition process that ensures stability during laser irradiation and acid treatment. Another noteworthy patent is titled "Polymers and Use Thereof," which describes compositions that include a silicon, germanium, and/or tin-based polymer with a protecting group. These materials serve as resists, exhibiting enhanced resistance to reactive ion etching while being sensitive to imaging irradiation.
Career Highlights: C Richard Guarnieri's career includes significant tenure at the prestigious International Business Machines Corporation (IBM). His experience at IBM has been pivotal, providing a strong foundation for his innovative work within the fields of materials science and photolithography. His insights and expertise have enabled advancements that are critical in the fast-paced world of technology.
Collaborations: Guarnieri has collaborated with notable professionals in the industry, including Marie Angelopoulos and Ari Aviram. Their collective efforts have contributed to the development of groundbreaking technologies that improve the functionality and efficiency of photomasks.
Conclusion: C Richard Guarnieri's contributions to innovation in photomask technology underline his position as a visionary inventor. With a robust portfolio of patents, he continues to influence the field of semiconductor manufacturing through his dedication to research and collaboration. His achievements mirror the importance of creativity and innovation in driving progress within the technology sector.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.