The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Jul. 12, 1999
Applicant:
Inventors:
Marie Angelopoulos, Cortlandt Manor, NY (US);
Ari Aviram, Croton-on-Hudson, NY (US);
Edward D. Babich, Chappequa, NY (US);
Timothy Allan Brunner, Ridgefield, CT (US);
Thomas Benjamin Faure, Georgia, VT (US);
C. Richard Guarnieri, Somers, NY (US);
Ranee W. Kwong, Wappingers Falls, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ;
U.S. Cl.
CPC ...
G03F 7/004 ;
Abstract
The reactive ion etching resistance of radiation sensitive resist composition is enhanced by adding at least one organometallic compound to a radiation sensitive polymer. The resist composition can be patterned and used as mask for patterning an underlying layer.