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For the Inventor, By the Inventor

Chappaqua, NY, United States of America

Edward D Babich

USPTO Granted Patents = 23

Average Co-Inventor Count = 5.5

ph-index = 9

Forward Citations = 417(Granted Patents)


Location History:

  • Peekskill, NY (US) (1986)
  • Ridgefield, CT (US) (1987 - 1991)
  • Chappequa, NY (US) (2002)
  • Chappaqua, NY (US) (1991 - 2004)

Company Filing History:

goldMedal23 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1986-2004

where 'Filed Patents' based on already Granted Patents

23 patents (USPTO):
1. 6685853 - Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith (2004-02-03),
2. 6617086 - Forming a pattern of a negative photoresist (2003-09-09),
3. 6436605 - Plasma resistant composition and use thereof (2002-08-20),
4. 6251569 - Forming a pattern of a negative photoresist (2001-06-26),
5. 6132644 - Energy sensitive electrically conductive admixtures (2000-10-17),
6. 5830332 - Sputter deposition of hydrogenated amorphous carbon film and (1998-11-03),
7. 5770345 - Photoresist having increased sensitivity and use thereof (1998-06-23),
8. 5753412 - Photoresist having increased sensitivity and use thereof (1998-05-19),
9. 5593812 - Photoresist having increased sensitivity and use thereof (1997-01-14),
10. 5565529 - Dielectric structures having embedded gap filling RIE etch stop (1996-10-15),
11. 5457005 - Dry developable photoresist and use thereof (1995-10-10),
12. 5286599 - Base developable negative photoresist composition and use thereof (1994-02-15),
13. 5238773 - Alkaline developable photoresist composition containing radiation (1993-08-24),
14. 5229251 - Dry developable photoresist containing an epoxide, organosilicon and (1993-07-20),
15. 5141817 - Dielectric structures having embedded gap filling RIE etch stop (1992-08-25),

Title: Inventor Spotlight: Edward D Babich

Introduction:

Edward D Babich is a prolific inventor based in Chappaqua, NY, with an impressive portfolio of 23 patents. His innovative work in areas like electrically conductive admixtures and photoresist patterns has significantly contributed to the field of microelectronics.

Latest Patents:

Among his latest patents is an invention titled "Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith." This creation combines an electrically conductive material with an energy-sensitive material to produce a conductive energy-sensitive composition. These structures are particularly valuable in microelectronic lithography for countering charging effects on resists from electron beams.

Another notable patent by Babich is "Forming a pattern of a negative photoresist," introducing a novel group of non-chemically amplified negative tone resists. These resists, developed through a redistribution of carbon-oxygen bonds in polymer ester groups, offer enhanced performance in water/aqueous-based development processes.

Career Highlights:

Edward D Babich is affiliated with the esteemed International Business Machines Corporation (IBM), where he continues to drive innovation through his patent-worthy creations. His dedication to advancing technology is evident in the quality and impact of his patents.

Collaborations:

In his professional journey, Babich has collaborated with talented individuals such as Michael Hatzakis and Jane M Shaw. These partnerships have likely enriched his work, leading to the development of cutting-edge solutions in the field of microelectronics.

Conclusion:

Edward D Babich stands as a trailblazing inventor whose contributions have shaped the landscape of microelectronics. His inventive spirit, coupled with a drive for excellence, underscores his remarkable career and reinforces his status as a key figure in the industry.

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