The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1995
Filed:
Jul. 02, 1993
Applicant:
Inventors:
Edward D Babich, Chappaqua, NY (US);
Jeffrey D Gelorme, Plainville, CT (US);
Ronald W Nunes, Hopewell Junction, NY (US);
Sharon L Nunes, Hopewell Junction, NY (US);
Jurij R Paraszczak, Pleasantville, NY (US);
Russell J Serino, Ridgefield, CT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430296 ; 430325 ; 430330 ; 430921 ; 430942 ;
Abstract
A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
Babich, Edward. (1995). Dry developable photoresist and use thereof (U.S. Patent No. 5457005). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5457005
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile