Hopewell Junction, NY, United States of America

Sharon L Nunes


Average Co-Inventor Count = 6.6

ph-index = 5

Forward Citations = 561(Granted Patents)


Company Filing History:


Years Active: 1992-2004

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: The Innovative Mind of Sharon L. Nunes: A Leader in Biometric and Dielectric Technologies

Introduction: Sharon L. Nunes, based in Hopewell Junction, NY, is a distinguished inventor known for her contributions to the fields of biometric authentication and dielectric structures. With a remarkable portfolio of seven patents, she has made significant strides in developing technologies that address critical challenges in security and electronics.

Latest Patents: Among her recent innovations are two notable patents. The first, "Method for biometric-based authentication in wireless communication for access control," focuses on improving the speed and security of smart card systems. Traditional systems often face delays and the risk of card loss, as well as vulnerabilities associated with network-stored biometric data. Nunes’ solution promotes the local storage of biometric templates within a portable device, enhancing both security and usability by allowing wireless transmission or local measurements for authentication purposes.

Her second patent, "Dielectric structures having embedded gap filling RIE etch stop," presents an innovative approach to dielectric materials. This technology features a copolymeric reactive ion etch barrier that provides high thermal stability and fills gaps in electronic structures. The use of polymers, particularly polyimide materials, positions her invention as a vital resource in various electronic applications, allowing for more efficient manufacturing processes.

Career Highlights: Nunes has dedicated a significant portion of her career to innovation at the International Business Machines Corporation (IBM), where she has honed her expertise in developing cutting-edge technologies. Her work not only demonstrates her technical prowess but also reflects her commitment to advancing the capabilities of electronic and security systems.

Collaborations: Throughout her career, Nunes has collaborated with esteemed colleagues, including Edward D. Babich and Jurij R. Paraszczak. These partnerships have facilitated a dynamic exchange of ideas, enhancing the effectiveness and scope of their collective innovations.

Conclusion: Sharon L. Nunes stands out as a pioneering inventor whose work in biometric and dielectric technologies continues to shape and enhance our interaction with secure systems. With her innovative solutions, she not only addresses contemporary challenges but also paves the way for future advancements in the fields of security and electronics. Her contributions reflect the spirit of innovation that drives progress in technology today.

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