The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 1993
Filed:
Apr. 29, 1991
Applicant:
Inventors:
Edward D Babich, Chappaqua, NY (US);
Jeffrey D Gelorme, Plainville, CT (US);
Ronald W Nunes, Hopewell Junction, NY (US);
Sharon L Nunes, Hopewell Junction, NY (US);
Jurij R Paraszczak, Pleasantville, NY (US);
Russell J Serino, Ridgefield, CT (US);
Assignee:
International Business Machines Corp., Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430280 ; 522 31 ; 522146 ; 522134 ; 522170 ;
Abstract
A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
Babich, Edward. (1993). Dry developable photoresist containing an epoxide, organosilicon and (U.S. Patent No. 5229251). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5229251
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile