The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Aug. 13, 1999
Applicant:
Inventors:
Marie Angelopoulos, Cortlandt Manor, NY (US);
Edward D. Babich, Chappaqua, NY (US);
Inna V. Babich, Chappaqua, NY (US);
Katherina E. Babich, Chappaqua, NY (US);
James J. Bucchignano, Yorktown, NY (US);
Karen E. Petrillo, Mahopac, NY (US);
Steven A. Rishton, Hayward, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 ; G03F 7/004 ;
U.S. Cl.
CPC ...
G03F 7/30 ; G03F 7/004 ;
Abstract
A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.