Thomas Benjamin Faure

This inventor holds 23 USPTO granted patents, primarily in Photomask Technology. Top assignee: International Business Machines Corporation. Active years: 1992-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Thomas Benjamin Faure. Retrieved from https://idiyas.com/inventor/thomas-benjamin-faure

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 23

% Patents Active = 65.2

Average Co-Inventor Count = 4.0

ph-index = 6

Forward Citations = 205(Granted Patents)

Location History:

Georgia, VT (US) (1992 - 2004)
Milton, VT (US) (1992 - 2021)

Company Filing History:

23 out of 166,425

International Business Machines Corporation

patents

Years Active: 1992-2021

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Areas of Expertise:

Photomask Fabrication

Etching Techniques

Phase Shift Masks

Chrome Etch

Feature Size Modification

X-ray Mask

Thin Coatings

Contaminant Inhibition

Electrodeposition

Three Dimensional Structures

CD Uniformity

Plating Process

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11143953 - Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 (2021-10-12),

2. 8568959 - Techniques for reducing degradation and/or modifying feature size of photomasks (2013-10-29),

3. 7861208 - Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks (2010-12-28),

4. 7754394 - Method to etch chrome for photomask fabrication (2010-07-13),

5. 7709300 - Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks (2010-05-04),

6. 7014959 - CD uniformity of chrome etch to photomask process (2006-03-21),

7. 7014958 - Method for dry etching photomask material (2006-03-21),

8. 6758912 - Method of inhibiting contaminants using dilute acid rinse (2004-07-06),

9. 6494966 - Method of minimizing contaminating deposits using dilute acid rinse (2002-12-17),

10. 6436605 - Plasma resistant composition and use thereof (2002-08-20),

11. 6426177 - Single component developer for use with ghost exposure (2002-07-30),

12. 6287434 - Plating cell apparatus for x-ray mask fabrication (2001-09-11),

13. 6270949 - Single component developer for copolymer resists (2001-08-07),

14. 6162565 - Dilute acid rinse after develop for chrome etch (2000-12-19),

15. 6039858 - Plating process for x-ray mask fabrication (2000-03-21),

Title: The Innovative Mind of Thomas Benjamin Faure

Introduction: Thomas Benjamin Faure, a talented inventor hailing from Milton, VT (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Thomas Benjamin Faure holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: With a career spanning over two decades, Faure has consistently pushed the boundaries of innovation. His work has revolutionized industries such as renewable energy, healthcare technology, and consumer electronics.

Collaborations: Faure has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work in multidisciplinary teams has led to the development of cutting-edge technologies.

Conclusion: Thomas Benjamin Faure's passion for innovation and his relentless pursuit of excellence have solidified his position as a visionary inventor in the world of technology. His contributions continue to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]