The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2001
Filed:
Apr. 11, 2000
Applicant:
Inventors:
Thomas B. Faure, Milton, VT (US);
Steven D. Flanders, Colchester, VT (US);
James P. Levin, South Burlington, VT (US);
Harold G. Linde, Richmond, VT (US);
Jeffrey F. Shepard, Starksboro, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/30 ;
Abstract
A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl 3-ethoxy propionate (EEP).
Quick Actions:
Faure, Thomas. (2001). Single component developer for copolymer resists (U.S. Patent No. 6270949). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6270949
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile