South Burlington, VT, United States of America

James P Levin

USPTO Granted Patents = 10 

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 57(Granted Patents)


Location History:

  • Shelburne, VT (US) (1983)
  • Jericho, VT (US) (1992)
  • So. Burlington, VT (US) (2002)
  • South Burlington, VT (US) (2001 - 2018)

Company Filing History:


Years Active: 1983-2018

Loading Chart...
10 patents (USPTO):

Title: The Innovative Contributions of James P Levin

Introduction

James P Levin is a notable inventor based in South Burlington, Vermont. He has made significant contributions to the field of technology, particularly in the area of photomask design and evaluation. With a total of 10 patents to his name, Levin's work has had a considerable impact on the industry.

Latest Patents

One of Levin's latest patents is focused on a test pattern layout for a test photomask and a method for evaluating critical dimension changes. This invention includes a test photomask that features a plurality of cells with a varied density pattern. The design incorporates two groups of cells arranged along different lines, each having a specific combined density ratio. Notably, the varied density pattern is engineered to substantially neutralize fogging effects, enhancing the effectiveness of the photomask.

Career Highlights

Throughout his career, James P Levin has worked with prominent companies such as International Business Machines Corporation (IBM) and Toppan Printing Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field.

Collaborations

Levin has collaborated with several talented individuals, including Joseph L Malenfant, Jr. and Thomas Benjamin Faure. These partnerships have fostered a creative environment that has led to the development of innovative solutions in technology.

Conclusion

James P Levin's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in photomask design and evaluation methods.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…