New Haven, VT, United States of America

Jeffrey F Shepard


Average Co-Inventor Count = 5.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Starksboro, VT (US) (2001)
  • New Haven, VT (US) (2002)

Company Filing History:


Years Active: 2001-2002

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: The Innovations of Jeffrey F. Shepard

Introduction

Jeffrey F. Shepard is a notable inventor based in New Haven, Vermont. He has made significant contributions to the field of photosensitive resists, holding two patents that showcase his innovative approach to developing copolymer materials. His work is particularly relevant in the realm of semiconductor manufacturing and photolithography.

Latest Patents

Shepard's latest patents include a "Single component developer for use with ghost exposure" and a "Single component developer for copolymer resists." Both patents describe a method for developing copolymer photosensitive resists using a single solvent in conjunction with a puddle develop tool. The copolymer resist utilized in these patents is ZEP 7000, and the developer is ethyl 3-ethoxy propionate (EEP). These innovations streamline the development process and enhance the efficiency of photolithographic techniques.

Career Highlights

Jeffrey F. Shepard is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of technology and innovation. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements in semiconductor technology.

Collaborations

Some of his notable coworkers include Thomas Benjamin Faure and Steven D. Flanders. Their collaborative efforts have likely played a role in the successful development of Shepard's patents and innovations.

Conclusion

Jeffrey F. Shepard's contributions to the field of photosensitive resists demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of materials science and a dedication to improving manufacturing processes.

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