The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Mar. 21, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Robert L. Sandstrom, Chestnut Ridge, NY (US);
Peter H. Bartlau, Essex Junction, VT (US);
Thomas B. Faure, Milton, VT (US);
Supratik Guha, Chicago, IL (US);
Edward W. Kiewra, Underhill, VT (US);
Louis M. Kindt, Underhill, VT (US);
Alfred Wagner, Brewster, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/68 (2012.01);
U.S. Cl.
CPC ...
G03F 1/68 (2013.01);
Abstract
The invention relates to a method used in a photolithographic process comprising depositing a film of Atomic Layered Deposition (ALD) AlOon a photomask, subjecting said film of AlOon the photomask to a plasma treatment and then irradiating the deposited film of ALD AlOon the coated photomask at a wavelength of 193 nm.