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For the Inventor, By the Inventor

Milton, VT, United States of America

Louis M Kindt

USPTO Granted Patents = 11

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 38(Granted Patents)


Location History:

  • Milton, VT (US) (2004 - 2010)
  • Essex Junction, VT (US) (2012 - 2014)
  • Underhill, VT (US) (2021)

Company Filing History:

goldMedal11 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 2004-2021

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):
1. 11143953 - Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 (2021-10-12),
2. 8758962 - Method and apparatus for sub-pellicle defect reduction on photomasks (2014-06-24),
3. 8173331 - Method and apparatus for sub-pellicle defect reduction on photomasks (2012-05-08),
4. 7826038 - Method for adjusting lithographic mask flatness using thermally induced pellicle stress (2010-11-02),
5. 7537114 - System and method for storing and transporting photomasks in fluid (2009-05-26),
6. 7355680 - Method for adjusting lithographic mask flatness using thermally induced pellicle stress (2008-04-08),
7. 7198872 - Light scattering EUVL mask (2007-04-03),
8. 7198276 - Adaptive electrostatic pin chuck (2007-04-03),
9. 7132206 - Process and apparatus for minimizing thermal gradients across an advanced lithographic mask (2006-11-07),
10. 7049035 - Method for controlling linewidth in advanced lithography masks using electrochemistry (2006-05-23),
11. 6777137 - EUVL mask structure and method of formation (2004-08-17),

Title: Innovations of Louis M Kindt

Introduction

Louis M Kindt is a notable inventor based in Milton, VT (US), recognized for his contributions to the field of photolithography. With a total of 11 patents to his name, he has made significant advancements in the protection of photomasks used in various technological applications.

Latest Patents

One of his latest patents is focused on the protection of photomasks from 193nm radiation damage using thin coatings of Atomic Layered Deposition (ALD) Al2O3. This invention relates to a method used in a photolithographic process, which involves depositing a film of ALD AlO on a photomask, subjecting the film to plasma treatment, and then irradiating the deposited film at a wavelength of 193 nm. Another significant patent is a method and apparatus for sub-pellicle defect reduction on photomasks. This invention includes a photomask for use in photolithography, featuring a substrate with a pattern formed on it, and a protective coating made of a silicon-based compound.

Career Highlights

Louis M Kindt is currently associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore innovative solutions in the realm of photolithography, contributing to the advancement of technology in this field.

Collaborations

Throughout his career, Louis has collaborated with talented individuals such as Emily Gallagher and Carey W Thiel. These collaborations have fostered a creative environment that has led to the development of groundbreaking inventions.

Conclusion

Louis M Kindt's contributions to the field of photolithography through his innovative patents and collaborations highlight his significant role as an inventor. His work continues to influence advancements in technology and the protection of photomasks.

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