The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Jan. 05, 2005
Emily F. Gallagher, Burlington, VT (US);
Louis M. Kindt, Milton, VT (US);
James A. Slinkman, Montpelier, VT (US);
Richard E. Wistrom, Essex Junction, VT (US);
Emily F. Gallagher, Burlington, VT (US);
Louis M. Kindt, Milton, VT (US);
James A. Slinkman, Montpelier, VT (US);
Richard E. Wistrom, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature.