Burlington, VT, United States of America

Emily Gallagher



Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 39(Granted Patents)


Location History:

  • Bulington, VT (US) (2019)
  • Burlington, VT (US) (2006 - 2023)

Company Filing History:


Years Active: 2006-2023

where 'Filed Patents' based on already Granted Patents

18 patents (USPTO):

Title: Emily Gallagher: Pioneer in Extreme Ultraviolet Lithography

Introduction

Emily Gallagher, based in Burlington, Vermont, is a noteworthy inventor in the field of extreme ultraviolet lithography (EUVL). With an impressive portfolio of 18 patents, she has made significant contributions to the advancement of lithographic techniques vital for the semiconductor industry.

Latest Patents

Among her most recent innovations, Emily has developed a patented method for forming an extreme ultraviolet lithography pellicle. The method involves coating a carbon nanotube (CNT) membrane and attaching it to a pellicle frame. This sophisticated approach includes pre-coating the CNTs with a seed material and employing atomic layer deposition to create an outer coating that fully encapsulates the pre-coated CNTs.

Additionally, she has made strides with her patent for an extreme ultraviolet lithography device. This device features a reticle with a lithographic pattern intended for imaging on a target wafer. It is designed with a light-transmissive pellicle membrane that strategically scatters transmitted light and integrates an EUV illumination system to achieve an asymmetric illumination distribution. This innovation enhances the effectiveness of light captured by the imaging system, allowing for improved lithographic processes.

Career Highlights

Emily has gained valuable experience working with renowned companies, notably IBM and Imec Vzw. Her work at these institutions has allowed her to develop critical technologies and forge a path forward in the EUVL field.

Collaborations

Throughout her career, Emily has collaborated with talented colleagues such as Cedric Huyghebaert and Ivan Pollentier. These collaborations have played a pivotal role in her research and development efforts, fostering innovative solutions within the realm of advanced lithography.

Conclusion

Emily Gallagher's contributions to the field of extreme ultraviolet lithography underscore her role as a leading inventor. Through her latest patents and collaborative efforts, she continues to influence and innovate within the semiconductor industry, paving the way for future technological advancements.

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