The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
May. 15, 2018
Imec Vzw, Leuven, BE;
Imec Usa Nanoelectronics Design Center, Kissimmee, FL (US);
Emily Gallagher, Burlington, VT (US);
Cedric Huyghebaert, Heverlee, BE;
Ivan Pollentier, Langdorp, BE;
Hanns Christoph Adelmann, Wilsele, BE;
Marina Timmermans, Bertem, BE;
Jae Uk Lee, Heverlee, BE;
IMEC VZW, Leuven, BE;
Imec USA Nanoelectronics Design Center, Kissimmee, FL (US);
Abstract
The present disclosure relates to a method for forming a carbon nanotube pellicle membrane for an extreme ultraviolet lithography reticle, the method comprising: bonding together overlapping carbon nanotubes of at least one carbon nanotube film by pressing the at least one carbon nanotube film between a first pressing surface and a second pressing surface, thereby forming a free-standing carbon nanotube pellicle membrane. The present disclosure also relates to a method for forming a pellicle for extreme ultraviolet lithography and for forming a reticle system for extreme ultraviolet lithography respectively.