Jae Uk Lee

Title: Innovations of Jae Uk Lee: Pioneering Extreme-Ultraviolet Lithography

Introduction

Jae Uk Lee, an accomplished inventor based in Heverlee, Belgium, has made significant contributions to the field of extreme-ultraviolet (extreme-UV) lithography. With a total of four patents to his name, his innovative work reflects the forefront of technological advancement in nanotechnology and materials science.

Latest Patents

Among Jae Uk Lee's recent inventions is a patent with the title "Mask for extreme-ultraviolet (extreme-UV) lithography and method for manufacturing the same." This invention centers around a sophisticated mask designed specifically for extreme-UV lithography. The mask is characterized by a substrate that supports a reflecting structure, which effectively reflects extreme-UV radiation from a specific angle. It incorporates attenuating and phase-shifting portions that are essential for modifying the extreme-UV radiation that the mask reflects, thereby enhancing the precision of lithographic processes through intricate height variations on the mask's upper surface.

Another noteworthy patent is titled "Method for forming a pellicle". This invention presents a method for creating a pellicle suitable for extreme-UV lithography. It involves forming a coating on a carbon nanotube pellicle membrane and adequately bonding it to a pellicle frame. This innovative method shows promise in improving the performance and durability of pellicles used in fine lithographic applications, pushing the boundaries of current manufacturing capabilities in the semiconductor industry.

Career Highlights

Jae Uk Lee's expertise and innovative capabilities have been honed through his work at prominent institutions such as Imec Vzw and the Imec USA Nanoelectronics Design Center. These organizations are renowned for their cutting-edge research and development in nanoelectronics, providing an ideal environment for Lee to develop his patents.

Collaborations

Throughout his career, Jae Uk Lee has collaborated with talented individuals including Emily Gallagher and Cedric Huyghebaert. Their teamwork has contributed to the successful development and implementation of pioneering technologies that stand to advance the field of extreme-UV lithography.

Conclusion

In summary, Jae Uk Lee's work exemplifies a commitment to innovation within the realm of advanced lithographic technology. With several patents focused on enhancing extreme-UV lithography techniques, his contributions are poised to impact the semiconductor industry significantly. As the demand for precision in microfabrication continues to grow, inventors like Jae Uk Lee will remain at the forefront of technological advancement.