The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
May. 15, 2018
Imec Vzw, Leuven, BE;
Imec Usa Nanoelectronics Design Center, Kissimmee, FL (US);
Marina Timmermans, Bertem, BE;
Emily Gallagher, Burlington, VT (US);
Ivan Pollentier, Langdorp, BE;
Hanns Christoph Adelmann, Wilsele, BE;
Cedric Huyghebaert, Heverlee, BE;
Jae Uk Lee, Heverlee, BE;
IMEC VZW, Leuven, BE;
Imec USA Nanoelectronics Design Center, Kissimmee, FL (US);
Abstract
The present disclosure relates to a method for forming a pellicle for extreme ultraviolet lithography, the method comprising: forming a coating of a first material on a peripheral region of a main surface of a carbon nanotube pellicle membrane, the membrane including a carbon nanotube film, arranging the carbon nanotube pellicle membrane on a pellicle frame with the peripheral region facing a support surface of the pellicle frame, wherein the support surface of the pellicle frame is formed by a second material, and bonding together the coating of the carbon nanotube pellicle membrane and the pellicle support surface by pressing the carbon nanotube pellicle membrane and the pellicle support surface against each other. The present disclosure relates also relates to a method for forming a reticle system for extreme ultraviolet lithography.