The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
May. 15, 2018
Applicants:
Imec Vzw, Leuven, BE;
Imec Usa Nanoelectronics Design Center, Kissimmee, FL (US);
Inventors:
Rik Jonckheere, Mechelen, BE;
Cedric Huyghebaert, Heverlee, BE;
Emily Gallagher, Bulington, VT (US);
Assignees:
IMEC VZW, Leuven, BE;
IMEC USA NANOELECTRONICS DESIGN CENTER, Kissimmee, FL (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/64 (2012.01); G03F 1/62 (2012.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01); G03F 1/62 (2013.01); G03F 7/70825 (2013.01); G03F 7/70975 (2013.01); G03F 7/70983 (2013.01);
Abstract
The present disclosure provides a lithographic reticle system comprising a reticle, a first pellicle membrane mounted in front of the reticle, and a second pellicle membrane mounted in front of the first pellicle membrane, wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane, and wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle.