The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Jun. 02, 2014
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Emily E. Gallagher, Burlington, VT (US);
Gregory R. McIntyre, Clifton Park, NY (US);
Alfred Wagner, Brewster, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); G03F 1/24 (2012.01); G03F 1/72 (2012.01); G03F 1/74 (2012.01);
U.S. Cl.
CPC ...
G03F 1/74 (2013.01); G03F 1/22 (2013.01); G03F 1/24 (2013.01); G03F 1/72 (2013.01);
Abstract
Methods and structures for extreme ultraviolet (EUV) lithography are disclosed. A method includes determining a phase error correction for a defect in an EUV mask, determining an amplitude error correction for the EUV mask based on both the defect in the EUV mask and the phase error correction, and modifying the EUV mask with the determined phase error correction and the determined amplitude error correction.