Alfred Wagner

USPTO Granted Patents = 27 (Patent Applications = 2)

Average Co-Inventor Count = 2.5

ph-index = 9

Forward Citations = 393(Granted Patents)

Company Filing History:

26 out of 164,108

International Business Machines Corporation

Years Active: 1992-2021

where 'Filed Patents' based on already Granted Patents

27 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11143953 - Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 (2021-10-12),

2. 10058388 - Laser surgical apparatus and methods of its use minimizing damage during the ablation of tissue using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width (2018-08-28),

3. 9102008 - Debris minimization and improved spatial resolution in pulsed laser ablation of materials (2015-08-11),

4. 9052617 - Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks (2015-06-09),

5. 8748063 - Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks (2014-06-10),

6. 8726202 - Mitigation of mask defects by pattern shifting (2014-05-13),

7. 8568959 - Techniques for reducing degradation and/or modifying feature size of photomasks (2013-10-29),

8. 8458623 - Mitigation of mask defects by pattern shifting (2013-06-04),

9. 8442299 - Evaluation of image processing algorithms (2013-05-14),

10. 8389890 - Method for minimizing sample damage during the ablation of a first biological material disposed on a second biological material using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width (2013-03-05),

11. 8344286 - Enhanced quality of laser ablation by controlling laser repetition rate (2013-01-01),

12. 7994450 - Debris minimization and improved spatial resolution in pulsed laser ablation of materials (2011-08-09),

13. 7759606 - Method and apparatus for repair of reflective photomasks (2010-07-20),

14. 7732104 - System and method for eliminating the structure and edge roughness produced during laser ablation of a material (2010-06-08),

15. 7649153 - Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed laser beam (2010-01-19),

Title: Alfred Wagner: A Pioneer in Photolithography and Laser Technology

Introduction

Alfred Wagner, based in Brewster, NY, has made significant contributions to the fields of photolithography and laser technology, holding an impressive total of 27 patents. His innovative approaches have advanced the understanding and application of laser systems and materials used in critical manufacturing processes.

Latest Patents

Among his latest inventions, Wagner developed a method for protecting photomasks from 193nm radiation damage using thin coatings of Atomic Layered Deposition (ALD) Al₂O₃. This process involves depositing a film of ALD Al₂O₃ on a photomask, followed by plasma treatment and irradiation at a wavelength of 193 nm. This innovative method ensures the longevity and reliability of photomasks in photolithographic processes.

Wagner has also created a sophisticated laser surgical apparatus designed to minimize tissue damage during surgical procedures. This device utilizes a focused ultrashort pulsed laser beam, where the slope of fluence breakdown varies with the pulse width. The apparatus includes a handpiece housing a laser cavity and a controller that optimally positions the laser beam for effective tissue ablation through induced breakdown.

Career Highlights

Throughout his career, Alfred Wagner has held positions at renowned companies such as IBM and GlobalFoundries Inc. His work in these organizations has facilitated advancements in semiconductor technology and laser applications in surgery, showcasing his role as an innovator in the industry.

Collaborations

Wagner has collaborated with notable professionals, including Richard Alan Haight and Peter P Longo. This teamwork has resulted in valuable contributions to his areas of expertise, enabling the development of groundbreaking technologies that enhance both manufacturing and medical practices.

Conclusion

Alfred Wagner’s dedication to innovation in photolithography and laser technology is evidenced by his substantial patent portfolio. His contributions not only elevate the standards of manufacturing precision but also offer advancements in medical technology that improve surgical outcomes. As a leading inventor, Wagner's impact on these fields continues to inspire future generations of innovators.

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2 patents pending:

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