The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Sep. 30, 2008
Applicants:
Richard A. Haight, Mahopac, NY (US);
Peter P. Longo, Hopewell Junction, NY (US);
Alfred Wagner, Brewster, NY (US);
Inventors:
Richard A. Haight, Mahopac, NY (US);
Peter P. Longo, Hopewell Junction, NY (US);
Alfred Wagner, Brewster, NY (US);
Assignee:
International Business Machine Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/06 (2014.01); B23K 26/03 (2006.01); B23K 26/073 (2006.01); B23K 26/14 (2014.01); B23K 26/16 (2006.01); B23K 26/36 (2014.01); B23K 26/40 (2014.01); G03F 1/82 (2012.01); B41M 5/24 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0635 (2013.01); B23K 26/032 (2013.01); B23K 26/0656 (2013.01); B23K 26/0732 (2013.01); B23K 26/1405 (2013.01); B23K 26/147 (2013.01); B23K 26/1417 (2013.01); B23K 26/1476 (2013.01); B23K 26/16 (2013.01); B23K 26/365 (2013.01); B23K 26/4015 (2013.01); B41M 5/24 (2013.01); G03F 1/82 (2013.01); B23K 2201/42 (2013.01);
Abstract
A method of minimizing the deposition of debris onto a sample being ablated. The method comprises: 1) reducing a laser pulse energy to approximately a threshold level for ablation; 2) focusing the energy using an immersion object lens having a final element and 3) ablating a region of the sample using a multitude of laser pulses, each pulse being sufficiently separated in time to reduce a concentration of ablation products in a gas phase.