Gregory R McIntyre

Title: Gregory R. McIntyre: Innovator in Lithographic Technologies

Introduction

Gregory R. McIntyre is a notable inventor based in Clifton Park, NY (US), recognized for his contributions to lithographic technologies. With a total of 9 patents to his name, McIntyre has made significant advancements in the field of semiconductor manufacturing.

Latest Patents

Among his latest patents is the innovative method for image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution. This patent describes a pupil filter designed for various combinations of illumination lenses and lithographic features. The pupil filter can be strategically placed at the pupil plane of a projection optics system, allowing for the design of lithographic masks that can print one-dimensional arrays of line and space features or two-dimensional arrays of contact holes. Additionally, McIntyre has developed a method for the fabrication of on-product aberration monitors using nanomachining. This method involves generating a phase-shifting pattern within a production mask, enhancing the precision of photolithographic patterning on semiconductor substrates.

Career Highlights

Throughout his career, Gregory R. McIntyre has worked with prominent companies such as IBM and Globalfoundries Inc. His experience in these leading organizations has contributed to his expertise in lithographic technologies and semiconductor manufacturing processes.

Collaborations

McIntyre has collaborated with talented individuals in the industry, including Emily Gallagher and Alfred Wagner. These collaborations have likely fostered innovation and the exchange of ideas in their respective fields.

Conclusion

Gregory R. McIntyre's work in lithographic technologies has significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing technology in this critical field.