The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Sep. 12, 2013
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventor:
Gregory R. McIntyre, Clifton Park, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G03F 1/82 (2012.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); G01N 21/956 (2013.01); G01N 2021/95676 (2013.01);
Abstract
A method of fabricating an aberration monitor on a production mask used in photolithographic patterning of a semiconductor substrate is provided. The method may include placing a production mask within a nanomachine repair tool and generating, using the nanomachine repair tool, a phase shifting pattern within a region of the production mask.
Quick Actions:
McIntyre, Gregory. (2015). Fabrication of on-product aberration monitors with nanomachining (U.S. Patent No. 9086639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9086639
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile