The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Sep. 22, 2010
Emily E. Gallagher, Burlington, VT (US);
Jed H. Rankin, Richmond, VT (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Emily E. Gallagher, Burlington, VT (US);
Jed H. Rankin, Richmond, VT (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and system arrangement for controlling and determining mask operation activities. Upon obtaining chip physical layout design data and running resolution enhancement technology on the chip physical layout design to generate mask features which may include any sub-resolution assist features, a placement sensitivity metric is determined for each of the generated mask features or edge fragments. In one alternative embodiment an edge placement sensitivity metric is determined for each edge of the generated mask features or edge fragments. The determined sensitivity metrics for each feature are classified and applied to subsequent mask operational activities such as post processing, write exposure and mask repair. The types of decisions based on the sensitivity metric may include minimizing or maximizing OPC processing; e-beam exposure adjustment in mask write; and selection of which mask features to repair as well as what repair criteria to then apply, and adjusting quality requirement criteria for manufacturing assessment.