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For the Inventor, By the Inventor

Yorktown Heights, NY, United States of America

Alan Edward Rosenbluth

This inventor holds 105 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Lithography Optimization (CPC class G03F1-36). Top assignees: International Business Machines Corporation, Globalfoundries Inc.. Active years: 1990-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alan Edward Rosenbluth. Retrieved from https://idiyas.com/inventor/alan-edward-rosenbluth

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 105 

% Patents Active = 53.3

 

Average Co-Inventor Count = 2.8

ph-index = 21

Forward Citations = 1,493(Granted Patents)

Forward Citations (Not Self Cited) = 1,382(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Watson, NY (US) (2012 - 2013)
  • Yorktown Heights, NY (US) (1990 - 2024)

Company Filing History:

goldMedal103 out of 166,325 
 
International Business Machines Corporation
 patents
silverMedal2 out of 5,671 
 
Globalfoundries Inc.
 patents

Years Active: 1990-2024

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Areas of Expertise:
Qubit Frequency Crowding
Integrated Circuit Masks
Dimensional Compensation
Lithography Solutions
Mask Design Method
Manufacturability Optimization
Wavefront Engineering
Photoresist Images
Process Calibration
Fracturing Masks
Source-Mask Optimization
Electromagnetic Effects
105 patents (USPTO):Explore Patents
1. 12039402 - Color-map method to eliminate qubit frequency crowding in a quantum computing chip (2024-07-16),
2. 10915686 - Tool to provide integrated circuit masks with accurate dimensional compensation of patterns (2021-02-09),
3. 10872188 - Tool to provide integrated circuit masks with accurate dimensional compensation of patterns (2020-12-22),
4. 10437950 - Tool to provide integrated circuit masks with accurate dimensional compensation of patterns (2019-10-08),
5. 10394984 - Tool to provide integrated circuit masks with accurate dimensional compensation of patterns (2019-08-27),
6. 10210295 - Tool to provide integrated circuit masks with accurate dimensional compensation of patterns (2019-02-19),
7. 10120963 - Figurative models calibrated to correct errors in process models (2018-11-06),
8. 9857676 - Method and program product for designing source and mask for lithography (2018-01-02),
9. 9651856 - Source, target and mask optimization by incorporating contour based assessments and integration over process variations (2017-05-16),
10. 9395622 - Synthesizing low mask error enhancement factor lithography solutions (2016-07-19),
11. 9310674 - Mask that provides improved focus control using orthogonal edges (2016-04-12),
12. 9250535 - Source, target and mask optimization by incorporating countour based assessments and integration over process variations (2016-02-02),
13. 8959462 - Mask design method, program, and mask design system (2015-02-17),
14. 8954898 - Source-mask optimization for a lithography process (2015-02-10),
15. 8910089 - Printing process calibration and correction (2014-12-09),

Title: Innovator Spotlight: Alan Edward Rosenbluth

Introduction: Meet Alan Edward Rosenbluth, a prolific inventor based in Yorktown Heights, NY, with an impressive portfolio of 104 patents. His groundbreaking work has significantly impacted the field of semiconductor fabrication and mask definition tools.

Latest Patents: Alan's latest patents showcase his expertise in developing tools for providing integrated circuit masks with accurate dimensional compensation of patterns. These innovative methods involve complex decomposition processes utilizing coherent optimal coherent systems (OCS) kernels and loxicoherent systems, which enhance the precision and efficiency of semiconductor fabrication masks.

Career Highlights: Alan has made significant contributions to companies such as IBM and Globalfoundries Inc., where he has leveraged his expertise to drive technological advancements in the semiconductor industry. His dedication to innovation and problem-solving has earned him recognition as a leading figure in the field.

Collaborations: Throughout his career, Alan has collaborated with esteemed professionals in the industry, including Kafai Lai and Kehan Tian. Together, they have worked on pioneering projects that have pushed the boundaries of semiconductor technology and paved the way for new advancements in the field.

Conclusion: Alan Edward Rosenbluth's remarkable journey as an inventor is a testament to his passion for innovation and his relentless pursuit of excellence in semiconductor technology. His visionary approach and collaborative spirit continue to inspire those around him, shaping the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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