Jun Ye

This inventor holds 131 USPTO granted patents and 6 published patent applications and 4 EPO patents, primarily in Photolithography Optimization (CPC class G03F7-705). Top assignees: Asml Netherlands B.v., Brion Technologies, Inc., Onetta, Inc.. Active years: 1998-2022.

USPTO Granted Patents = 131 (Patent Applications = 6)

% Patents Active = 84.0

EPO Patents = 4 (Patent Applications = 3)

Average Co-Inventor Count = 3.2

ph-index = 32

Forward Citations = 3,129(Granted Patents)

Forward Citations (Not Self Cited) = 2,727(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

73 out of 5,065

Asml Netherlands B.v.

patents

28 out of 30

Brion Technologies, Inc.

Cepton Technologies, Inc.

patents

5. 3 out of 1,787

Kla Tencor Corporation

patents

6. 2 out of 641

Kla-Tencor Technologies Corporation

patents

7. 1 out of 166,264

International Business Machines Corporation

patents

8. 1 out of 5,497

Leland Stanford Junior University

patents

9. 3 out of 834,411

Other

patents

where one patent can have more than one assignee

Years Active: 1998-2022

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Areas of Expertise:

Photolithography

Lidar Systems

Three-Dimensional Sensing

Mask Optimization

Scanner Tuning

Process Calibration

Pattern Design

Optical Proximity Correction

Image Stability

Computational Control

Vibration Cancellation

Wavefront Aberration

131 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11461532 - Three-dimensional mask model for photolithography simulation (2022-10-04),

2. 11372337 - Method of performing model-based scanner tuning (2022-06-28),

3. 11300684 - Scanning lidar systems for three-dimensional sensing (2022-04-12),

4. 11042687 - Fast freeform source and mask co-optimization method (2021-06-22),

5. 10955530 - Systems for vibration cancellation in a lidar system (2021-03-23),

6. 10846442 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2020-11-24),

7. 10839131 - Three-dimensional mask model for photolithography simulation (2020-11-17),

8. 10795266 - Method of performing model-based scanner tuning (2020-10-06),

9. 10754036 - Scanning illuminated three-dimensional imaging systems (2020-08-25),

10. 10690754 - Scanning apparatuses and methods for a lidar system (2020-06-23),

11. 10592633 - Fast freeform source and mask co-optimization method (2020-03-17),

12. 10569469 - Model-based scanner tuning systems and methods (2020-02-25),

13. 10451740 - Scanning lidar systems for three-dimensional sensing (2019-10-22),

14. 10424396 - Computation pipeline of location-dependent variant calls (2019-09-24),

15. 10424395 - Computation pipeline of single-pass multiple variant calls (2019-09-24),

Title: The Innovative Journey of Jun Ye

Introduction: Jun Ye, a pioneering inventor based in Palo Alto, CA, has made significant contributions to the field of technology and innovation through his groundbreaking inventions and patents.

Latest Patents: Jun Ye holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a career spanning over two decades, Jun Ye has worked with leading tech companies and research institutions, spearheading projects that have revolutionized various industries. His keen eye for detail and passion for innovation have led to the development of cutting-edge technologies.

Collaborations: Jun Ye has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge sharing. His collaborative efforts have resulted in the successful implementation of groundbreaking ideas and solutions.

Conclusion: Jun Ye's relentless pursuit of innovation and his commitment to pushing the boundaries of technology make him a true visionary in the world of inventions. His impact on the industry is profound, and his legacy as an inventor continues to inspire future generations of innovators.