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Santa Clara, CA, United States of America

Brion Technologies, Inc.

USPTO Granted Patents = 30

% Expired Patents = 6.7

Forward Citations = 1,919

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20 inventors (with patents filed for the assignee):

Jun Ye (28 out of 131 patents)

Xun Chen (20 out of 26 patents)

Yu Long Cao (9 out of 123 patents)

4. R Fabian W Pease (8 out of 13 patents)

5. Luoqi Chen (6 out of 39 patents)

6. Yen-Wen Lu (6 out of 53 patents)

7. Stefan Hunsche (5 out of 47 patents)

8. Jiangwei Li (2 out of 13 patents)

9. James Norman Wiley (1 out of 26 patents)

10. Been-Der Chen (1 out of 19 patents)

11. Guangqing Chen (1 out of 11 patents)

12. Shauh-Teh Juang (1 out of 14 patents)

13. Moshe E Preil (1 out of 28 patents)

14. Peng Liu (1 out of 46 patents)

15. R Fabian Pease (1 out of 11 patents)

Core Competencies:

Optical Proximity Correction

Lithography Simulation

Mask Verification

Aerial Image Quality

Integrated Circuit Defects

Process Window Optimization

Data Acquisition

Fabrication Monitoring

30 patents: Sort by Forward Citations

1. 7707538 - Multivariable solver for optical proximity correction (2010-04-27),

2. 7703069 - Three-dimensional mask model for photolithography simulation (2010-04-20),

3. 7695876 - Method for identifying and using process window signature patterns for lithography process control (2010-04-13),

4. 7694267 - Method for process window optimized optical proximity correction (2010-04-06),

5. 7617477 - Method for selecting and optimizing exposure tool using an individual mask error model (2009-11-10),

6. 7587704 - System and method for mask verification using an individual mask error model (2009-09-08),

7. 7564017 - System and method for characterizing aerial image quality in a lithography system (2009-07-21),

8. 7558419 - System and method for detecting integrated circuit pattern defects (2009-07-07),

9. 7488933 - Method for lithography model calibration (2009-02-10),

10. 7233874 - Method and apparatus for monitoring integrated circuit fabrication (2007-06-19),

11. 7171334 - Method and apparatus for synchronizing data acquisition of a monitored IC fabrication process (2007-01-30),

12. 7120895 - System and method for lithography simulation (2006-10-10),

13. 7117478 - System and method for lithography simulation (2006-10-03),

14. 7117477 - System and method for lithography simulation (2006-10-03),

15. 7114145 - System and method for lithography simulation (2006-09-26),

Company Overview

Brion Technologies, Inc., based in Santa Clara, California, specializes in advanced technology solutions for the semiconductor industry. The company focuses on developing innovative software and hardware tools that enhance the design and manufacturing processes of integrated circuits. With a strong emphasis on optical proximity correction and lithography simulation, Brion aims to improve yield and performance in semiconductor fabrication, supporting the evolving demands of high-tech applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

30 Patents

#116 in Santa Clara, CA

#2,682 in California

#11,279 in US

#21,912 in the World

Santa Clara, CA, United States of America

Brion Technologies, Inc.

Forward Citations = 1,919

20 inventors:

Jun Ye (28 out of 131 patents)

Xun Chen (20 out of 26 patents)

Yu Long Cao (9 out of 123 patents)

4. R Fabian W Pease (8 out of 13 patents)

5. Luoqi Chen (6 out of 39 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Brion Technologies, Inc.. Retrieved from https://idiyas.com/company/brion-technologies

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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