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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Moshe E Preil

This inventor holds 28 USPTO granted patents and 3 published patent applications, primarily in Lithography Technology. Top assignees: Luminescent Technologies, Inc., Kla-Tencor Technologies Corporation, Globalfoundries Inc.. Active years: 2005-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moshe E Preil. Retrieved from https://idiyas.com/inventor/moshe-e-preil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 28 

% Patents Active = 89.3

Average Co-Inventor Count = 3.2

ph-index = 13

Forward Citations = 530(Granted Patents)


Company Filing History:

goldMedal7 out of 35 
 
Luminescent Technologies, Inc.
 patents
silverMedal6 out of 641 
 
Kla-Tencor Technologies Corporation
 patents
bronzeMedal5 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 4 out of 5,093 
 
Asml Netherlands B.v.
 patents
5. 4 out of 1,787 
 
Kla Tencor Corporation
 patents
6. 1 out of 30 
 
Brion Technologies, Inc.
 patents
7. 1 out of 624 
 
Kla Corporation
 patents

Years Active: 2005-2021

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Areas of Expertise:
Lithography
Metrology
Defect Dispositioning
Integrated Circuits
Directed Self-Assembly
Pattern Recognition
Photo-mask Inspection
Wafer Processing
Process Control
Overlay Metrology
Chemical Templates
Laser Annealing
28 patents (USPTO):Explore Patents
1. 10990019 - Stochastic reticle defect dispositioning (2021-04-27),
2. 10777377 - Multi-column spacing for photomask and reticle inspection and wafer print check verification (2020-09-15),
3. 10474042 - Stochastically-aware metrology and fabrication (2019-11-12),
4. 10262408 - System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer (2019-04-16),
5. 9530662 - Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control (2016-12-27),
6. 9508562 - Sidewall image templates for directed self-assembly materials (2016-11-29),
7. 9188974 - Methods for improved monitor and control of lithography processes (2015-11-17),
8. 8956808 - Asymmetric templates for forming non-periodic patterns using directed self-assembly materials (2015-02-17),
9. 8889343 - Optimizing lithographic processes using laser annealing techniques (2014-11-18),
10. 8790522 - Chemical and physical templates for forming patterns using directed self-assembly materials (2014-07-29),
11. 8644588 - Photo-mask and wafer image reconstruction (2014-02-04),
12. 8331645 - Photo-mask and wafer image reconstruction (2012-12-11),
13. 8318391 - Process window signature patterns for lithography process control (2012-11-27),
14. 8280146 - Photo-mask and wafer image reconstruction (2012-10-02),
15. 8260032 - Photo-mask and wafer image reconstruction (2012-09-04),

Title: The Innovative Journey of Moshe E Preil

Introduction: Moshe E Preil is a visionary inventor based in Sunnyvale, California, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Moshe E Preil holds several patents in various technological domains, showcasing his versatility and ingenuity in creating novel solutions to complex problems.

Career Highlights: With a career spanning over two decades, Moshe E Preil has worked tirelessly to push the boundaries of technological advancement. His dedication to innovation has led to the development of cutting-edge products that have revolutionized the industry.

Collaborations: Throughout his career, Moshe E Preil has collaborated with leading tech companies, research institutions, and universities to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Moshe E Preil's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His contributions continue to inspire the next generation of inventors and shape the future of technological innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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