The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2009
Filed:
Sep. 08, 2006
Jun YE, Palo Alto, CA (US);
Stefan Hunsche, Sunnyvale, CA (US);
Jun Ye, Palo Alto, CA (US);
Stefan Hunsche, Sunnyvale, CA (US);
Brion Technologies, Inc., Santa Clara, CA (US);
Abstract
Methods are disclosed for selecting and optimizing an exposure tool using an individual mask error model. In one embodiment, a method includes selecting a model of a lithography process including an optical model of an exposure tool and a resist model, creating an individual mask error model representing a mask manufactured using mask layout data, simulating the lithography process using the model of the lithography process and the individual mask error model to produce simulated patterns, determining differences between the simulated patterns and a design target, and optimizing settings of the exposure tool based on the differences between the simulated patterns and the design target.