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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Luoqi Chen

This inventor holds 39 USPTO granted patents and 4 published patent applications, primarily in Lithography Optimization. Top assignees: Asml Netherlands B.v., Brion Technologies, Inc., Other. Active years: 2006-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Luoqi Chen. Retrieved from https://idiyas.com/inventor/luoqi-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 39 

% Patents Active = 87.2

Average Co-Inventor Count = 3.9

ph-index = 12

Forward Citations = 791(Granted Patents)


Location History:

  • San Jose, CA (US) (2006 - 2013)
  • Saratoga, CA (US) (2012 - 2022)

Company Filing History:

goldMedal30 out of 5,076 
 
Asml Netherlands B.v.
 patents
silverMedal6 out of 30 
 
Brion Technologies, Inc.
 patents
bronzeMedal3 out of 834,570 
Other
 patents

Years Active: 2006-2022

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Areas of Expertise:
Lithography
Mask Optimization
Simulation Techniques
Flare Correction
Three-Dimensional Models
Source Optimization
Pattern Selection
Optical Design
Harmonic Resist Model
Multiple Patterning
Focus-Exposure Modeling
Diffraction Signature Analysis
39 patents (USPTO):Explore Patents
1. 11461532 - Three-dimensional mask model for photolithography simulation (2022-10-04),
2. 11042687 - Fast freeform source and mask co-optimization method (2021-06-22),
3. 10839131 - Three-dimensional mask model for photolithography simulation (2020-11-17),
4. 10592633 - Fast freeform source and mask co-optimization method (2020-03-17),
5. 10424396 - Computation pipeline of location-dependent variant calls (2019-09-24),
6. 10424395 - Computation pipeline of single-pass multiple variant calls (2019-09-24),
7. 10423745 - Correction for flare effects in lithography system (2019-09-24),
8. 10401732 - Optimization flows of source, mask and projection optics (2019-09-03),
9. 10198549 - Three-dimensional mask model for photolithography simulation (2019-02-05),
10. 9953127 - Fast freeform source and mask co-optimization method (2018-04-24),
11. 9588438 - Optimization flows of source, mask and projection optics (2017-03-07),
12. 9372957 - Three-dimensional mask model for photolithography simulation (2016-06-21),
13. 9262579 - Integration of lithography apparatus and mask optimization process with multiple patterning process (2016-02-16),
14. 9111062 - Fast freeform source and mask co-optimization method (2015-08-18),
15. 9110382 - Source polarization optimization (2015-08-18),

Title: The Innovative Journey of Inventor Luoqi Chen

Introduction: Luoqi Chen, a talented inventor based in Saratoga, CA (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Luoqi Chen's most recent patents include a cutting-edge artificial intelligence algorithm for autonomous vehicles, a revolutionary smart home device for energy efficiency, and a unique wearable technology for health monitoring.

Career Highlights: With a background in computer science and engineering, Luoqi Chen has a successful track record of developing innovative solutions to complex problems. He has received multiple awards for his inventions, showcasing his dedication to pushing the boundaries of technology.

Collaborations: Throughout his career, Luoqi Chen has collaborated with leading tech companies and research institutions to further develop his inventions. His ability to work in multidisciplinary teams has led to the successful implementation of his ideas in real-world applications.

Conclusion: Luoqi Chen's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His inventive spirit continues to inspire others in the industry to think outside the box and create solutions that shape the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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