The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Nov. 09, 2011
Duan-fu Hsu, Fremont, CA (US);
Luoqi Chen, Saratoga, CA (US);
Hanying Feng, Fremont, CA (US);
Rafael C. Howell, Santa Clara, CA (US);
Xinjian Zhou, Fremont, CA (US);
Yi-fan Chen, Sunnyvale, CA (US);
Duan-Fu Hsu, Fremont, CA (US);
Luoqi Chen, Saratoga, CA (US);
Hanying Feng, Fremont, CA (US);
Rafael C. Howell, Santa Clara, CA (US);
Xinjian Zhou, Fremont, CA (US);
Yi-Fan Chen, Sunnyvale, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as 'lens', and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics may be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process.