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Fremont, CA, United States of America

Hanying Feng

USPTO Granted Patents = 30 (Patent Applications = 4)

Average Co-Inventor Count = 3.4

ph-index = 9

Forward Citations = 260(Granted Patents)

Location History:

San Jose, CA (US) (2019)
Fremont, CA (US) (2011 - 2020)

Company Filing History:

28 out of 4,899

Asml Netherlands B.v.

2 out of 832,912

Other

patents

Years Active: 2011-2020

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30 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10846442 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2020-11-24),

2. 10424396 - Computation pipeline of location-dependent variant calls (2019-09-24),

3. 10424395 - Computation pipeline of single-pass multiple variant calls (2019-09-24),

4. 10423075 - Methods and systems for pattern design with tailored response to wavefront aberration (2019-09-24),

5. 10401732 - Optimization flows of source, mask and projection optics (2019-09-03),

6. 10310371 - Method and system for lithography process-window-maximizing optical proximity correction (2019-06-04),

7. 10169522 - Methods and system for model-based generic matching and tuning (2019-01-01),

8. 10025885 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2018-07-17),

9. 10025198 - Smart selection and/or weighting of parameters for lithographic process simulation (2018-07-17),

10. 9779186 - Methods for performing model-based lithography guided layout design (2017-10-03),

11. 9619603 - Optimization of source, mask and projection optics (2017-04-11),

12. 9588438 - Optimization flows of source, mask and projection optics (2017-03-07),

13. 9390206 - Methods and systems for lithography process window simulation (2016-07-12),

14. 9378309 - Pattern-independent and hybrid matching/tuning including light manipulation by projection optics (2016-06-28),

15. 9360766 - Method and system for lithography process-window-maximixing optical proximity correction (2016-06-07),

Title: The Innovative Journey of Hanying Feng

Introduction: Hanying Feng, a pioneering inventor based in Fremont, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Hanying Feng holds several patents in the areas of artificial intelligence, renewable energy, and advanced materials. His most recent patent focuses on a revolutionary method for enhancing solar panel efficiency through nanotechnology.

Career Highlights: With a background in engineering and a passion for innovation, Hanying Feng has enjoyed a successful career marked by numerous achievements. He has worked for leading tech companies, where he has spearheaded projects that have pushed the boundaries of what is possible in the industry.

Collaborations: Throughout his career, Hanying Feng has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Hanying Feng's relentless pursuit of innovation and his commitment to pushing the limits of technology have established him as a respected figure in the world of inventors. His work continues to inspire the next generation of innovators to dream big and create a better future through groundbreaking inventions.

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