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For the Inventor, By the Inventor

Fremont, CA, United States of America

Hanying Feng

This inventor holds 30 USPTO granted patents and 4 published patent applications, primarily in Lithography Calibration. Top assignees: Asml Netherlands B.v., Other. Active years: 2011-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hanying Feng. Retrieved from https://idiyas.com/inventor/hanying-feng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 83.3

Average Co-Inventor Count = 3.4

ph-index = 9

Forward Citations = 270(Granted Patents)


Location History:

  • San Jose, CA (US) (2019)
  • Fremont, CA (US) (2011 - 2020)

Company Filing History:

goldMedal28 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal2 out of 834,453 
Other
 patents

Years Active: 2011-2020

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Areas of Expertise:
Lithography Calibration
Optical Proximity Correction
Wavefront Aberration
Process Window Simulation
Pattern Design
Optics Optimization
Model-Based Matching
Parameter-Sensitive Design
Light Manipulation
Layout Design
Sub-Resolution Assist Features
30 patents (USPTO):Explore Patents
1. 10846442 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2020-11-24),
2. 10424396 - Computation pipeline of location-dependent variant calls (2019-09-24),
3. 10424395 - Computation pipeline of single-pass multiple variant calls (2019-09-24),
4. 10423075 - Methods and systems for pattern design with tailored response to wavefront aberration (2019-09-24),
5. 10401732 - Optimization flows of source, mask and projection optics (2019-09-03),
6. 10310371 - Method and system for lithography process-window-maximizing optical proximity correction (2019-06-04),
7. 10169522 - Methods and system for model-based generic matching and tuning (2019-01-01),
8. 10025885 - Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration (2018-07-17),
9. 10025198 - Smart selection and/or weighting of parameters for lithographic process simulation (2018-07-17),
10. 9779186 - Methods for performing model-based lithography guided layout design (2017-10-03),
11. 9619603 - Optimization of source, mask and projection optics (2017-04-11),
12. 9588438 - Optimization flows of source, mask and projection optics (2017-03-07),
13. 9390206 - Methods and systems for lithography process window simulation (2016-07-12),
14. 9378309 - Pattern-independent and hybrid matching/tuning including light manipulation by projection optics (2016-06-28),
15. 9360766 - Method and system for lithography process-window-maximixing optical proximity correction (2016-06-07),

Title: The Innovative Journey of Hanying Feng

Introduction: Hanying Feng, a pioneering inventor based in Fremont, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Hanying Feng holds several patents in the areas of artificial intelligence, renewable energy, and advanced materials. His most recent patent focuses on a revolutionary method for enhancing solar panel efficiency through nanotechnology.

Career Highlights: With a background in engineering and a passion for innovation, Hanying Feng has enjoyed a successful career marked by numerous achievements. He has worked for leading tech companies, where he has spearheaded projects that have pushed the boundaries of what is possible in the industry.

Collaborations: Throughout his career, Hanying Feng has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Hanying Feng's relentless pursuit of innovation and his commitment to pushing the limits of technology have established him as a respected figure in the world of inventors. His work continues to inspire the next generation of innovators to dream big and create a better future through groundbreaking inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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