The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Nov. 10, 2014
Asml Netherlands B.v., Veldhoven, NL;
Hua-Yu Liu, Palo Alto, CA (US);
Jiangwei Li, Palo Alto, CA (US);
Luoqi Chen, Saratoga, CA (US);
Wei Liu, Los Altos, CA (US);
Jiong Jiang, Sunnyvale, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic apparatus is simulated by mathematically combining a density map of the design layout at the exposure field with a point spread function (PSF), wherein system-specific effects on the flare map may be incorporated in the simulation. Location-dependent flare corrections for the design layout are calculated by using the determined flare map, thereby reducing the effect of flare.