Asml Netherlands B.v.

Brion Technologies, Inc.

Onetta, Inc.

Cepton Technologies, Inc.

Other

Kla Tencor Corporation

Kla-tencor Technologies Corporation

International Business Machines Corporation

Leland Stanford Junior University

Jun Ye

Yu Long Cao

Luoqi Chen

Hanying Feng

Xun Chen

Yen-Wen Lu

Wenjin Shao

Peng Liu

Stefan Hunsche

James Norman Wiley

Shauh-Teh Juang

James Patrick Koonmen

R Fabian W Pease

Mark Armstrong McCord

Hong M Chen

Moshe E Preil

Jun Pei

Michael J Gassner

Ronaldus Johannes Gijsbertus Goossens

Hua-Yu Liu

David Alles

Jiangwei Li

Youping Zhang

Liqun Han

Yupeng Cui

Yan Sun

Lance Glasser

Wei Zhou

Xiaofeng Liu

Yongan Wu

John Pease

Chien-Jen Chen

Ronaldus Johannes Gljsbertus Goossens

Johannes Catharinus Hubertus Mulkens

Gordon Cook Wilson

Mark Joseph Wihl

Antoine Jean Bruguier

R Fabian Pease

Guangqing Chen

Daryoosh Rejaly

Lih-Huah Yiin

Venugopal Vellanki

William S Wong

Min-Chun Tsai

George Q Chen

Chia-Chi Wang

G Victor Treyz

Zhi-Pan Li

Pei-Chun Chiang

Rene H Monnard

Hua Cao

Luogi Chen

Manman Ren

Lechuan Xue

Roger Fabian Pease

Michael T Takac

Mark Mccord

David S Alles

Yu Cao

A three-dimensional mask model that provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

Three-dimensional mask model for photolithography simulation

A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

Method of performing model-based scanner tuning

A lidar system includes a laser source, a photodetector, an emission lens, a receiving lens, and a processor. The laser source is configured to be translated through a plurality of emission locations, and to emit a plurality of laser pulses therefrom. The emission lens is configured to collimate and direct the plurality of laser pulses towards an object. The receiving lens is configured to focus the portion of each of the plurality of laser pulses reflected off of the object to a plurality of detection locations. The photodetector is configured to be translated through the plurality of detection locations, and to detect the portion of each of the plurality of laser pulses. The processor is configured to determine a time of flight for each of the plurality of laser pulses from emission to detection, and construct a three-dimensional image of the object based on the determined time of flight.

Scanning lidar systems for three-dimensional sensing

The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.

Fast freeform source and mask co-optimization method

A scanning lidar system includes an external frame, an internal frame attached to the external frame by vibration-isolation mounts, and an electro-optic assembly movably attached to the internal frame and configured to be translated with respect to the internal frame during scanning operation of the scanning lidar system.

Systems for vibration cancellation in a lidar system

Methods provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.

Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration

A three-dimensional imaging system includes a first illumination source configured to project a first fan of light toward an object in a field of view, and a second illumination source configured to project a second fan of light substantially parallel to and spaced apart from the first fan of light. The first illumination source and the second illumination source are further configured to scan the first fan of light and the second fan of light synchronously laterally across the field of view. The three-dimensional imaging system further includes a camera configured to capture a plurality of image frames of the field of view as the first fan of light and the second fan of light are scanned over a plurality of regions the object, and a processor coupled to the camera and configured to construct a three-dimensional image of the object based on the plurality of image frames.

Scanning illuminated three-dimensional imaging systems

A scanning lidar system includes a fixed frame, a first platform flexibly attached to the fixed frame, a lens assembly including a first lens and a second lens mounted on the first platform, a second platform flexible attached to the fixed frame, an electro-optic assembly including a first laser source and a first photodetector mounted on the second platform, a drive mechanism mechanically coupled to the first platform and the second platform and configured to translate the first platform and the second platform with respect to the fixed frame, and a controller coupled to the drive mechanism and configured to translate the first platform to a plurality of first positions through the drive mechanism and translate the second platform to a plurality of second positions through the drive mechanism such that a motion of the second platform is substantially opposite to a motion of the first platform.

Scanning apparatuses and methods for a lidar system

Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.

Model-based scanner tuning systems and methods

The present disclosure provides a computer-implemented method for analyzing variants from a plurality of nucleic acid sequence reads using a computation pipeline, which comprises a module depending on a location-dependent parameter. The method comprises executing on a processor the steps of: receiving a plurality of nucleic acid sequence reads comprising at least a first nucleic acid sequence read and a second nucleic acid sequence read; mapping the first nucleic acid sequence read and the second nucleic acid sequence read to a first location and a second location in a genome, respectively; setting a first value and a second value for the location-dependent parameter on the basis of the first location and the second location in the genome, respectively; passing the first nucleic acid sequence read and the second nucleic acid sequence read through the module using the first value and the second value, respectively; and generating a variant call.

Computation pipeline of location-dependent variant calls

The present disclosure provides a computer-implemented method of analyzing variants from a plurality of nucleic acid sequence reads. The method uses a computation pipeline having at least one invariable module and at least one variable module, wherein the variable module depends on a variable parameter. The method includes executing on a processor the steps of receiving the plurality of nucleic acid sequence reads; setting a plurality of values for the variable parameter; passing the plurality of the nucleic acid sequence reads through the invariable module to generate an intermediate output; passing the intermediate output through the variable module for multiple rounds, each round using one of the variable values; and generating a plurality of variant calls.

Computation pipeline of single-pass multiple variant calls

Growing community of inventors

Palo Alto, CA, United States of America

Jun Ye