Essex Junction, VT, United States of America

Peter H Bartlau


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 32(Granted Patents)


Location History:

  • Westford, VT (US) (2003 - 2013)
  • Essex Junction, VT (US) (2021)

Company Filing History:


Years Active: 2003-2021

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: The Innovations of Peter H Bartlau

Introduction

Peter H Bartlau is a notable inventor based in Essex Junction, Vermont, who has made significant contributions to the field of photolithography. With a total of three patents to his name, Bartlau's work focuses on enhancing the durability and functionality of photomasks used in the fabrication of integrated circuits.

Latest Patents

One of Bartlau's latest patents is titled "Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3." This invention relates to a method used in a photolithographic process, which involves depositing a film of Atomic Layered Deposition (ALD) Al2O3 on a photomask. The process includes subjecting the film to plasma treatment and subsequently irradiating it at a wavelength of 193 nm. Another significant patent is "Techniques for reducing degradation and/or modifying feature size of photomasks." This patent describes a photomask that includes a light-transmitting substrate and an absorber layer made of silicide, such as molybdenum silicide, patterned into various features. The invention emphasizes controlling the surrounding environment to prevent undesirable oxidation while encouraging desirable growth during exposure to light.

Career Highlights

Peter H Bartlau is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies in the field of photolithography. His work has been instrumental in advancing the capabilities of photomasks, which are critical components in the manufacturing of integrated circuits.

Collaborations

Throughout his career, Bartlau has collaborated with several esteemed colleagues, including Thomas Benjamin Faure and Alfred Wagner. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Peter H Bartlau's contributions to the field of photolithography through his patents and work at IBM highlight his role as a significant inventor. His innovative approaches to protecting photomasks and enhancing their functionality continue to impact the industry positively.

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