The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Oct. 16, 2007
Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
Thomas B. Faure, Milton, VT (US);
Howard S. Landis, Underhill, VT (US);
Jeanne-tania Sucharitaves, Williston, VT (US);
Thomas B. Faure, Milton, VT (US);
Howard S. Landis, Underhill, VT (US);
Jeanne-Tania Sucharitaves, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A design structure, method, and system for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks, or with other two-mask lithographic processes employing a trim mask. A design structure is embodied in a machine readable medium used in a design process, the design structure comprising regions in a finished semiconductor design that do not contain as-designed shapes. The design structure additionally includes dummy fill shapes in the regions at a predetermined final density, wherein the generated dummy shapes are sized so that their local density is increased to a predetermined value. Moreover, corresponding trim shapes act to expose an oversized portion of the dummy shape, effectively trimming each dummy shape back to the predetermined final density.