Croton-on-Hudson, NY, United States of America

Ari Aviram

This inventor holds 40 USPTO granted patents, primarily in Molecular Electronics. Top assignees: International Business Machines Corporation, Other. Active years: 1981-2011.

USPTO Granted Patents = 40

% Patents Active = 95.0

Average Co-Inventor Count = 2.3

ph-index = 12

Forward Citations = 531(Granted Patents)

Location History:

Yorktown Heights, NY (US) (1981 - 1986)
Croton-On-Hudson, NY (US) (1986 - 2011)

Company Filing History:

37 out of 166,159

International Business Machines Corporation

patents

3 out of 834,307

Other

patents

Years Active: 1981-2011

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Areas of Expertise:

Molecular Sensors

Molecular Electronics

Polymers

Negative Resists

Photo-active Polymers

Thermal Transfer Printing

Resist Compositions

Nanostructures

Organometallic Polymers

Capacitance Changes

Ink Transfer

Color-on-demand Printing

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8058644 - Nanostructure for molecular electronics comprising collinear metal lines defining precise nanoscale gap (2011-11-15),

2. 7824619 - Molecular sensors for explosives (2010-11-02),

3. 6989290 - Electrical contacts for molecular electronic transistors (2006-01-24),

4. 6821718 - Radiation sensitive silicon-containing negative resists and use thereof (2004-11-23),

5. 6689540 - Polymers and use thereof (2004-02-10),

6. 6653045 - Radiation sensitive silicon-containing negative resists and use thereof (2003-11-25),

7. 6503692 - Antireflective silicon-containing compositions as hardmask layer (2003-01-07),

8. 6458907 - Organometallic polymers and use thereof (2002-10-01),

9. 6436605 - Plasma resistant composition and use thereof (2002-08-20),

10. 6420088 - Antireflective silicon-containing compositions as hardmask layer (2002-07-16),

11. 6420084 - Mask-making using resist having SIO bond-containing polymer (2002-07-16),

12. 6348299 - RIE etch resistant nonchemically amplified resist composition and use thereof (2002-02-19),

13. 6346362 - Polymers and use thereof (2002-02-12),

14. 6280908 - Post-development resist hardening by vapor silylation (2001-08-28),

15. 6280901 - High sensitivity, photo-active polymer and developers for high resolution resist applications (2001-08-28),

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