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For the Inventor, By the Inventor

Croton-on-Hudson, NY, United States of America

Ari Aviram

USPTO Granted Patents = 40

Average Co-Inventor Count = 2.3

ph-index = 12

Forward Citations = 527(Granted Patents)


Location History:

  • Yorktown Heights, NY (US) (1981 - 1986)
  • Croton-On-Hudson, NY (US) (1986 - 2011)

Company Filing History:

goldMedal37 out of 164,197 
 
International Business Machines Corporation
 patents
silverMedal3 out of 832,843 
Other
 patents

Years Active: 1981-2011

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Areas of Expertise:
Molecular Electronics
Molecular Sensors
Electrical Contacts
Radiation Sensitive Resists
Organometallic Polymers
Thermal Transfer Printing
Photo-Active Polymers
Resist Composition
Graft Polymers
Ink Additives
Color-On-Demand Printing
Electrophoretical Methods
40 patents (USPTO):Explore Patents
1. 8058644 - Nanostructure for molecular electronics comprising collinear metal lines defining precise nanoscale gap (2011-11-15),
2. 7824619 - Molecular sensors for explosives (2010-11-02),
3. 6989290 - Electrical contacts for molecular electronic transistors (2006-01-24),
4. 6821718 - Radiation sensitive silicon-containing negative resists and use thereof (2004-11-23),
5. 6689540 - Polymers and use thereof (2004-02-10),
6. 6653045 - Radiation sensitive silicon-containing negative resists and use thereof (2003-11-25),
7. 6503692 - Antireflective silicon-containing compositions as hardmask layer (2003-01-07),
8. 6458907 - Organometallic polymers and use thereof (2002-10-01),
9. 6436605 - Plasma resistant composition and use thereof (2002-08-20),
10. 6420088 - Antireflective silicon-containing compositions as hardmask layer (2002-07-16),
11. 6420084 - Mask-making using resist having SIO bond-containing polymer (2002-07-16),
12. 6348299 - RIE etch resistant nonchemically amplified resist composition and use thereof (2002-02-19),
13. 6346362 - Polymers and use thereof (2002-02-12),
14. 6280908 - Post-development resist hardening by vapor silylation (2001-08-28),
15. 6280901 - High sensitivity, photo-active polymer and developers for high resolution resist applications (2001-08-28),

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