Ridgefield, CT, United States of America

Timothy A Brunner

This inventor holds 55 USPTO granted patents and 1 EPO patent, primarily in EUV Lithography (CPC class G03F). Top assignees: International Business Machines Corporation, Globalfoundries Inc., Mentor Graphics Corporation. Active years: 1994-2023.

USPTO Granted Patents = 55

% Patents Active = 58.2

EPO Patents = 1

Average Co-Inventor Count = 2.7

ph-index = 14

Forward Citations = 1,035(Granted Patents)

Forward Citations (Not Self Cited) = 941(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Ridgefield, NY (US) (2008 - 2012)
Hopewell Junction, NY (US) (2013 - 2014)
Ridgefield, CT (US) (1994 - 2023)

Company Filing History:

46 out of 166,159

International Business Machines Corporation

Mentor Graphics Corporation

Asml Netherlands B.v.

patents

6. 1 out of 15,005

Infineon Technologies Ag

patents

where one patent can have more than one assignee

Years Active: 1994-2023

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Areas of Expertise:

EUV Lithography

Focus Monitoring

Mask Design

Photolithography

Pattern Shift

Wafer Stress Control

Metrology

Optical Projection

Radiation-Sensitive Composition

Critical Dimension Control

Grating Test Pattern

Phase Calibration

55 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11703771 - Variable diffraction grating (2023-07-18),

2. 10552569 - Method for calculating non-correctable EUV blank flatness for blank dispositioning (2020-02-04),

3. 10012898 - EUV mask for monitoring focus in EUV lithography (2018-07-03),

4. 9997348 - Wafer stress control and topography compensation (2018-06-12),

5. 9921466 - Method for monitoring focus in EUV lithography (2018-03-20),

6. 9899183 - Structure and method to measure focus-dependent pattern shift in integrated circuit imaging (2018-02-20),

7. 9741581 - Using tensile mask to minimize buckling in substrate (2017-08-22),

8. 9588440 - Method for monitoring focus in EUV lithography (2017-03-07),

9. 9411249 - Differential dose and focus monitor (2016-08-09),

10. 9411223 - On-product focus offset metrology for use in semiconductor chip manufacturing (2016-08-09),

11. 9360858 - Alignment data based process control system (2016-06-07),

12. 9310674 - Mask that provides improved focus control using orthogonal edges (2016-04-12),

13. 9075944 - System and method of predicting problematic areas for lithography in a circuit design (2015-07-07),

14. 8679708 - Polarization monitoring reticle design for high numerical aperture lithography systems (2014-03-25),

15. 8582078 - Test method for determining reticle transmission stability (2013-11-12),

Title: The Innovative Journey of Timothy A. Brunner

Introduction: Timothy A. Brunner, a talented inventor hailing from Ridgefield, CT (US), has made significant contributions to the field of innovations with his creative mind and dedication.

Latest Patents: Timothy A. Brunner holds several patents in various technological areas, showcasing his versatility and expertise in inventing cutting-edge solutions to real-world problems.

Career Highlights: Throughout his illustrious career, Timothy A. Brunner has demonstrated a keen eye for identifying gaps in the market and developing unique inventions to fill those voids. His innovative spirit has led to the creation of groundbreaking technologies that have revolutionized industries.

Collaborations: Timothy A. Brunner has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Timothy A. Brunner stands as a beacon of innovation in the world of inventors, continuously pushing the boundaries of what is possible through his groundbreaking creations. His passion for innovation and commitment to excellence continue to inspire future generations of inventors.