The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Aug. 08, 2011
Christopher P. Ausschnitt, Naples, FL (US);
Timothy A. Brunner, Ridgefield, CT (US);
Allen H. Gabor, Katonah, NY (US);
Oleg Gluschenkov, Tannersville, NY (US);
Vinayan C. Menon, Hopewell Junction, NY (US);
Christopher P. Ausschnitt, Naples, FL (US);
Timothy A. Brunner, Ridgefield, CT (US);
Allen H. Gabor, Katonah, NY (US);
Oleg Gluschenkov, Tannersville, NY (US);
Vinayan C. Menon, Hopewell Junction, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, CY;
Abstract
Deformation of a substrate due to one or more processing steps is determined by measuring substrate alignment data at lithographic processing steps before and after the one or more processing steps. Any abnormal pattern in the alignment data differential is identified by comparing the calculated alignment data differential with previous data accumulated in a database. By comparing the abnormal pattern with previously identified tool-specific patterns for alignment data differential, a processing step that introduces the abnormal pattern and/or the nature of the abnormal processing can be identified, and appropriate process control measures can be taken to rectify any anomaly in the identified processing step.