Hopewell Junction, NY, United States of America

Allen H Gabor

USPTO Granted Patents = 38 (Patent Applications = 2)

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 188(Granted Patents)

Location History:

Hopewell Junction, NY (US) (2013 - 2014)
Katonah, NY (US) (2005 - 2022)

Company Filing History:

36 out of 164,108

International Business Machines Corporation

Infineon Technologies Ag

patents

where one patent can have more than one assignee

Years Active: 2005-2025

where 'Filed Patents' based on already Granted Patents

38 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12455505 - Method for forming continuous line-end to line-end spaces with spacer assisted lithography-etch-lithography etch processes (2025-10-28),

2. 11239077 - Litho-etch-litho-etch with self-aligned blocks (2022-02-01),

3. 10552569 - Method for calculating non-correctable EUV blank flatness for blank dispositioning (2020-02-04),

4. 10242952 - Registration mark formation during sidewall image transfer process (2019-03-26),

5. 10043760 - Registration mark formation during sidewall image transfer process (2018-08-07),

6. 9859224 - Registration mark formation during sidewall image transfer process (2018-01-02),

7. 9472506 - Registration mark formation during sidewall image transfer process (2016-10-18),

8. 9360858 - Alignment data based process control system (2016-06-07),

9. 9046788 - Method for monitoring focus on an integrated wafer (2015-06-02),

10. 8847416 - Multi-layer chip overlay target and measurement (2014-09-30),

11. 8673165 - Sidewall image transfer process with multiple critical dimensions (2014-03-18),

12. 8609322 - Process of making a lithographic structure using antireflective materials (2013-12-17),

13. 8592110 - Alignment marks for multi-exposure lithography (2013-11-26),

14. 8507346 - Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer (2013-08-13),

15. 8491984 - Structure resulting from chemical shrink process over BARC (bottom anti-reflective coating) (2013-07-23),

Title: The Innovative Contributions of Allen H. Gabor

Introduction

Allen H. Gabor is an esteemed inventor located in Hopewell Junction, NY, known for his remarkable contributions to the semiconductor industry. With an impressive portfolio of 37 patents, Gabor has consistently pushed the boundaries of innovation, particularly in the fields of lithography and mask structures.

Latest Patents

Among his latest inventions, Gabor has developed two notable patents that showcase his expertise. The first is a method titled "Litho-etch-litho-etch with self-aligned blocks," which involves a sophisticated process for fabricating semiconductor devices. This method includes forming mandrel cuts, surrounding the mandrels with spacer material, and executing additional processes such as creating dielectric trenches. The second patent, "Method for calculating non-correctable EUV blank flatness for blank dispositioning," focuses on mask structures and manufacturing techniques. This method outlines a comprehensive approach for determining flatness variations in masks, utilizing computing devices for precision measurements and adjustments.

Career Highlights

Throughout his illustrious career, Allen H. Gabor has made significant strides in technology while working for prominent companies. He has held key positions at International Business Machines Corporation (IBM) and Globalfoundries Inc., where he contributed to groundbreaking advancements and collaborated with top professionals in the field.

Collaborations

Gabor has worked alongside esteemed colleagues, including Scott David Halle and Colin J. Brodsky. These collaborations have enriched his work and enhanced the collective knowledge within the semiconductor community, driving innovation and excellence.

Conclusion

Allen H. Gabor's commitment to innovation and his extensive patent portfolio underscore his status as a leading inventor in the semiconductor industry. His latest patents demonstrate a keen understanding of complex manufacturing processes, and his collaborations with notable professionals highlight the value of teamwork in achieving groundbreaking advancements. As technology continues to evolve, Gabor's contributions will undoubtedly leave a lasting impact on the field.

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