The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2025
Filed:
Mar. 31, 2022
International Business Machines Corporation, Armonk, NY (US);
Allen Gabor, Katonah, NY (US);
Geng Han, Niskayuna, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Method and apparatus for improved and efficient spacer assisted lithography-etch-lithography etch (SALELE) processes that utilize a spin-on-material layer, where the spin-on-material layer fills gaps between spacers to protect line-end to line-end spaces created by a cut shape. The method and structures also include a final resist layer with varying critical dimensions (CDs). The use of the spin-on-material enables back end of line (BEOL) metal designs with continuous line-end to line-end spacing above a minimum that can be patterned with a cut mask and spacer only process.